Green Lithography for Delicate Materials. (23rd April 2021)

• Record Type: Journal Article
• Authors: Grebenko, Artem; Bubis, Anton; Motovilov, Konstantin; Dremov, Viacheslav; Korostylev, Evgeny; Kindiak, Ivan; Fedorov, Fedor S.; Luchkin, Sergey; Zhuikova, Yuliya; Trofimenko, Aleksandr; Filkov, Gleb; Sviridov, Georgiy; Ivanov, Andrey; Dull, Jordan T.; Mozhchil, Rais; Ionov, Andrey; Varlamov, Valery; Rand, Barry P.; Podzorov, Vitaly; Nasibulin, Albert G.
• Is Part Of: Advanced functional materials. Volume 31:Number 27(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-04-23
• Subjects: bio‐nanostructures -- delicate materials -- lithography -- organic semiconductors; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.202101533
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract: A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low‐dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top‐down and bottom‐up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub‐micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water‐based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale. Abstract : A genuinely water‐based eco‐friendly lithographic approach is demonstrated, where chitosan derivatives act as an e‐beam/ deep ultraviolet resist. The chelation of chitosan derivatives facilitates patterning at the nanoscale without any harsh solvents or physical treatments of the surface. Both bottom‐up and top‐down processes are implemented directly on the surface of unconventional delicate materials, owing to the ultimate cleanliness of the developed regions.