Origin of 1/f noise in graphene produced for large‐scale applications in electronics. Issue 1 (1st January 2015)

• Record Type: Journal Article
• Authors: Kochat, Vidya; Sahoo, Anindita; Pal, Atindra Nath; Eashwer, Sneha; Ramalingam, Gopalakrishnan; Sampathkumar, Arjun; Tero, Ryugu; Viet Thu, Tran; Kaushal, Sanjeev; Okada, Hiroshi; Sandhu, Adarsh; Raghavan, Srinivasan; Ghosh, Arindam
• Is Part Of: IET circuits, devices & systems. Volume 9:Issue 1(2015)
• Page Start: 52
• Page End: 58
• Publication Date: 2015-01-01
• Subjects: graphene -- 1/f noise -- flicker noise -- chemical vapour deposition; 1-f noise -- large-scale applications -- flicker noise -- graphene films -- chemical vapour deposition -- CVD -- chemical reduction -- electronics -- polycrystalline graphene films -- structural defects -- charged trap centres -- exfoliated graphene -- hydrazine-reduced graphene oxide films -- RGO oxide films -- localised crystal defects -- hydrazine treatment -- mobile defects -- noise amplitude; Electronic circuits -- Periodicals; Electronic systems -- Periodicals; 621.381505
• DOI: 10.1049/iet-cds.2014.0069
• Languages: English
• ISSNs: 1751-858X

Abstract

Abstract : The authors report a detailed investigation of the flicker noise (1/ f noise) in graphene films obtained from chemical vapour deposition (CVD) and chemical reduction of graphene oxide. The authors find that in the case of polycrystalline graphene films grown by CVD, the grain boundaries and other structural defects are the dominant source of noise by acting as charged trap centres resulting in huge increase in noise as compared with that of exfoliated graphene. A study of the kinetics of defects in hydrazine‐reduced graphene oxide (RGO) films as a function of the extent of reduction showed that for longer hydrazine treatment time strong localised crystal defects are introduced in RGO, whereas the RGO with shorter hydrazine treatment showed the presence of large number of mobile defects leading to higher noise amplitude.