Cite
HARVARD Citation
Weigel, C. et al. (2021). Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass. Advanced engineering materials. 23 (6), p. n/a. [Online].
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Weigel, C. et al. (2021). Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass. Advanced engineering materials. 23 (6), p. n/a. [Online].