Deposition of boron-containing coatings by electron-beam evaporation of boron-containing targets. Issue 4 (March 2020)

• Record Type: Journal Article
• Authors: Yushkov, Yu.G.; Oks, E.M.; Tyunkov, A.V.; Corbella, C.; Zolotukhin, D.B.
• Is Part Of: Ceramics international. Volume 46:Issue 4(2020)
• Page Start: 4519
• Page End: 4525
• Publication Date: 2020-03
• Subjects: Boron-containing coatings -- Electron beam deposition -- Medium vacuum -- Fore-vacuum plasma-cathode electron source; Ceramics -- Periodicals; Céramique industrielle -- Périodiques; Ceramics; Periodicals; Electronic journals; 666
• DOI: 10.1016/j.ceramint.2019.10.179
• Languages: English
• ISSNs: 0272-8842

Abstract

Abstract: Boron-containing films are promising materials for improving the hardness, wear-resistance and durability of mechanical parts used in industry. We describe a novel approach for deposition of such coatings – by using electron-beam evaporation of boron-containing target material (pure boron or boron nitride) in inert (helium) or chemically-active (oxygen, nitrogen, residual atmosphere) gases at medium vacuum. Boron-containing films deposited on titanium substrates were characterized using a nanohardness tester and a non-contact 3D profilometer. Elemental composition of the coatings was studied using raster electron microscope equipped with a device for EDX analysis. All boron-containing coatings provided significant improvement (by a factor of 4–16) in the microhardness of the substrate surface.