Nanogap Lithography: Spontaneous Formation of Nanogap Electrodes by Self‐Peeling Adhesion Lithography (Adv. Mater. Interfaces 17/2019). Issue 17 (6th September 2019)

• Record Type: Journal Article
• Authors: Luo, Sihai; Hoff, Bård H.; deMello, John C.
• Is Part Of: Advanced materials interfaces. Volume 6:Issue 17(2019)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2019-09-06
• Subjects: adhesion -- lithography -- nanogap -- self‐peeling; Materials science -- Periodicals; 620.11
• DOI: 10.1002/admi.201970107
• Languages: English
• ISSNs: 2196-7350

Abstract

Abstract : In article number 1900243, Sihai Luo, Bård H. Hoff, and John C. deMello report the fabrication of nanogap electrodes using a modification of adhesion lithography. A metal is patterned on a substrate, and conformally coated with a self‐assembled monolayer (SAM). A second metal is then deposited over the full area of the substrate. Finally, a polymer film with a high coefficient of thermal expansion is spin‐cast onto the second metal from a heated solution. As it cools, the polymer delaminates and strips away those parts of the second metal that are in contact with the SAM, leaving the two metals side‐by‐side on the substrate, separated by a nanogap.