Study of the effects of Ni+ ion implantation on morphology, structure, hardness, and electrical conductivity of brass. (20th April 2021)

• Record Type: Journal Article
• Authors: Shahnawaz, Muhammad
• Is Part Of: Surface and interface analysis. Volume 53:Number 7(2021)
• Page Start: 627
• Page End: 636
• Publication Date: 2021-04-20
• Subjects: crystallite size -- hardness -- morphology -- nickel ion implantation; Surfaces (Physics) -- Periodicals; Surface chemistry -- Periodicals; Thin films -- Periodicals; 541.33
• DOI: 10.1002/sia.6949
• Languages: English
• ISSNs: 0142-2421

Abstract

Abstract : In this study, nickel ions were implanted in brass at 2.0‐MeV energy doses ranging from 1.9 × 10 14, 4.8 × 10 14, and 1.0 × 10 15 ions cm −2 at room temperature. Formation of micro size particle cluster, crater, void, rust, and flower‐like structure were observed in scanning electron microscope (SEM) micrographs. XRD patterns explain the plane (1 1 1) and plane (2 2 0) under abrupt fluctuations, but in plane (2 0 0), systematic changes occur after ion implantation. Modifications in crystallite size, lattice strain, and dislocation density were discussed. In all the implanted specimens, values of hardness were smaller as compared with the unimplanted one. Precise changes occurred in the value of d ‐spacing that produced alteration in electrical conductivity at the initial ion doses. Therefore, electrical conductivity values were changed from 3.980E 6 (S/m) to 2.966E 7 (S/m). Further increment in the ion dose, electrical conductivity reduced to recover its value. Initial trend of hardness and electrical conductivity was nonlinear, but both tend to recuperate their values in the end. In FT‐IR spectra, three new bands were formed at 1261, 1417, and 1455 cm −1 after ion implantation that was due to change in bonding of brass.