NO2 Sensing Properties of WO3 Thin Films Deposited by Rf-Magnetron Sputtering. (10th April 2014)

• Record Type: Journal Article
• Authors: Sharma, Savita; Tomar, Monika; Puri, Nitin K.; Gupta, Vinay
• Other Names: Mandal P. Academic Editor.; Shivpuri R. K. Academic Editor.; Tiwari G. N. Academic Editor.
• Is Part Of: Conference papers in science. Volume 2014(2014)
• Publication Date: 2014-04-10
• Subjects: Science -- Periodicals; Science; Periodicals; 600
• DOI: 10.1155/2014/683219
• Languages: English
• ISSNs: 2356-6108

Abstract

Abstract : Tungsten trioxide (WO3 ) thin films were deposited by Rf-magnetron sputtering onto Pt interdigital electrodes fabricated on corning glass substrates. NO2 gas sensing properties of the prepared WO3 thin films were investigated by incorporation of catalysts (Sn, Zn, and Pt) in the form of nanoclusters. The structural and optical properties of the deposited WO3 thin films have been studied by X-ray diffraction (XRD) and UV-Visible spectroscopy, respectively. The gas sensing characteristics of all the prepared sensor structures were studied towards 5 ppm of NO2 gas. The maximum sensing response of about 238 was observed for WO3 film having Sn catalyst at a comparatively lower operating temperature of 200°C. The possible sensing mechanism has been highlighted to support the obtained results.