Recoil implantation using gas-phase precursor molecules. Issue 20 (14th May 2021)

• Record Type: Journal Article
• Authors: Gale, Angus; Fröch, Johannes E.; Kianinia, Mehran; Bishop, James; Aharonovich, Igor; Toth, Milos
• Is Part Of: Nanoscale. Volume 13:Issue 20(2021)
• Page Start: 9322
• Page End: 9327
• Publication Date: 2021-05-14
• Subjects: Nanoscience -- Periodicals; Nanotechnology -- Periodicals; 620.505
• DOI: 10.1039/d1nr00850a
• Languages: English
• ISSNs: 2040-3364

Abstract

Abstract : Schematic illustration of the recoil implantation process by using gas-phase precursor molecules. Abstract : Ion implantation underpins a vast range of devices and technologies that require precise control over the physical, chemical, electronic, magnetic and optical properties of materials. A variant termed "recoil implantation" – in which a precursor is deposited onto a substrate as a thin film and implanted via momentum transfer from incident energetic ions – has a number of compelling advantages, particularly when performed using an inert ion nano-beam [Fröch et al., Nat. Commun., 2020, 11, 5039]. However, a major drawback of this approach is that the implant species are limited to the constituents of solid thin films. Here we overcome this limitation by demonstrating recoil implantation using gas-phase precursors. Specifically, we fabricate nitrogen-vacancy (NV) color centers in diamond using an Ar + ion beam and the nitrogen-containing precursor gases N2, NH3 and NF3 . Our work expands the applicability of recoil implantation with the potential to be suitable to a larger portion of the periodic table, and to applications in which thin film deposition/removal is impractical.