Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films. Issue 20 (10th May 2021)

• Record Type: Journal Article
• Authors: Cruz, Alexander John; Arnauts, Giel; Obst, Martin; Kravchenko, Dmitry E.; Vereecken, Philippe M.; De Feyter, Steven; Stassen, Ivo; Hauffman, Tom; Ameloot, Rob
• Is Part Of: Dalton transactions. Volume 50:Issue 20(2021)
• Page Start: 6784
• Page End: 6788
• Publication Date: 2021-05-10
• Subjects: Chemistry, Inorganic -- Periodicals; Chemistry, Physical and theoretical -- Periodicals; Chemistry, Inorganic -- Periodicals; 546.05
• DOI: 10.1039/d1dt00927c
• Languages: English
• ISSNs: 1477-9226

Abstract

Abstract : Vapor-phase fabrication of the metal–organic framework ZIF-8 through the conversion of precursors prepared by physical, atomic, and molecular layer deposition. Abstract : Chemical vapor deposition of metal–organic frameworks (MOF-CVD) will facilitate the integration of porous and crystalline coatings in electronic devices. In the two-step MOF-CVD process, a precursor layer is first deposited and subsequently converted to a MOF through exposure to linker vapor. We herein report the impact of different metal oxide and metalcone layers as precursors for zeolitic imidazolate framework ZIF-8 films.