Cite
HARVARD Citation
Baek, G. et al. (2021). Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications. Ceramics international. 47 (13), pp. 19036-19042. [Online].
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Baek, G. et al. (2021). Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications. Ceramics international. 47 (13), pp. 19036-19042. [Online].