Electrochemically Exfoliating MoS2 into Atomically Thin Planar‐Stacking Through a Selective Lateral Reaction Pathway. (26th November 2020)
- Record Type:
- Journal Article
- Title:
- Electrochemically Exfoliating MoS2 into Atomically Thin Planar‐Stacking Through a Selective Lateral Reaction Pathway. (26th November 2020)
- Main Title:
- Electrochemically Exfoliating MoS2 into Atomically Thin Planar‐Stacking Through a Selective Lateral Reaction Pathway
- Authors:
- Pan, Xuelei
Yan, Mengyu
Sun, Congli
Zhao, Kangning
Luo, Wen
Hong, Xufeng
Zhao, Yunlong
Xu, Lin
Mai, Liqiang - Abstract:
- Abstract: The production of atomically thin transition‐metal dichalcogenides (TMDs) has been investigated through various top‐to‐down exfoliation methods, such as mechanical and chemical exfoliation, while large‐scale chemical exfoliation is sluggish and needs over ten hours to achieve atomically thin TMDs. Herein, a new strategy is reported for exfoliating bulk MoS2 into two/three‐layer flakes within tens of seconds through a mild electrochemical treatment. This exfoliation method is driven by a lateral inward oxidation reaction starting from the typical layer edge with a rapid depth penetration, whereby a stacked few‐layer (two/three layers) structure is ultimately formed. This efficient reaction process is monitored based on an individual MoS2 on‐chip device combined with in situ Raman and cross‐sectional scanning transmission electron microscopy, and the uniformity of thickness is demonstrated. This preferentially initiated method can be also extended to produce few‐layer MoSe2 and the selective extraction mechanism is assumed to be related to intrinsic layer‐dependent energy band properties. Moreover, the special reassembled few‐layer MoS2 possesses great performance as functional materials in electrocatalysis (127 mV overpotential for hydrogen evolution reaction) and surface‐enhanced Raman spectroscopy (10 5 enhancement factor). These results illustrate the broad prospects of the reassembled few‐layer MoS2 for optics, catalysis, and sensors. Abstract : EfficientAbstract: The production of atomically thin transition‐metal dichalcogenides (TMDs) has been investigated through various top‐to‐down exfoliation methods, such as mechanical and chemical exfoliation, while large‐scale chemical exfoliation is sluggish and needs over ten hours to achieve atomically thin TMDs. Herein, a new strategy is reported for exfoliating bulk MoS2 into two/three‐layer flakes within tens of seconds through a mild electrochemical treatment. This exfoliation method is driven by a lateral inward oxidation reaction starting from the typical layer edge with a rapid depth penetration, whereby a stacked few‐layer (two/three layers) structure is ultimately formed. This efficient reaction process is monitored based on an individual MoS2 on‐chip device combined with in situ Raman and cross‐sectional scanning transmission electron microscopy, and the uniformity of thickness is demonstrated. This preferentially initiated method can be also extended to produce few‐layer MoSe2 and the selective extraction mechanism is assumed to be related to intrinsic layer‐dependent energy band properties. Moreover, the special reassembled few‐layer MoS2 possesses great performance as functional materials in electrocatalysis (127 mV overpotential for hydrogen evolution reaction) and surface‐enhanced Raman spectroscopy (10 5 enhancement factor). These results illustrate the broad prospects of the reassembled few‐layer MoS2 for optics, catalysis, and sensors. Abstract : Efficient electrochemical exfoliation of MoS2 is realized through a lateral inward oxidation reaction starting from a typical layer edge with a rapid depth penetration, ultimately forming a stable stacked few‐layer (two/three layers) structure. This stacked atomically thin MoS2 shows enhanced electrocatalysis performance and surface‐enhanced Raman spectroscopy sensitivity. … (more)
- Is Part Of:
- Advanced functional materials. Volume 31:Number 8(2021)
- Journal:
- Advanced functional materials
- Issue:
- Volume 31:Number 8(2021)
- Issue Display:
- Volume 31, Issue 8 (2021)
- Year:
- 2021
- Volume:
- 31
- Issue:
- 8
- Issue Sort Value:
- 2021-0031-0008-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2020-11-26
- Subjects:
- electrochemical exfoliation -- in situ Raman -- MoS 2 -- on‐chip device -- surface‐enhanced Raman spectroscopy
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.202007840 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 16840.xml