Influence of MO-GaN templates on the HVPE growth of semi-polar GaN thick films. Issue 18 (20th April 2021)
- Record Type:
- Journal Article
- Title:
- Influence of MO-GaN templates on the HVPE growth of semi-polar GaN thick films. Issue 18 (20th April 2021)
- Main Title:
- Influence of MO-GaN templates on the HVPE growth of semi-polar GaN thick films
- Authors:
- Zhang, Lin
Wu, Jiejun
Han, Tong
Liu, Fang
Li, Mengda
Zhu, Xingyu
Zhao, Qiyue
Yu, Tongjun - Abstract:
- Abstract : This work illustrates the influence of MO-templates and competition mechanism on the HVPE growth of semi-polar GaN (11−22) & (10−13) thick layers. Abstract : In this paper, the growth of semi-polar GaN thick films was investigated on an m -plane sapphire by hydride vapor phase epitaxy (HVPE). By optimizing parameters of the HVPE process, both (11−22) and (10−13) semi-polar GaN films have been successfully obtained with a mirror surface and excellent crystal quality on different GaN templates grown by metal organic chemical vapor deposition (MOCVD), respectively. The influence of MO-GaN templates on the HVPE growth was further studied. The results revealed that the same plane of a semi-polar HVPE-GaN thick layer was grown on a single-phase template, such as GaN (11−22)HVPE on (11−22)MO-template and GaN (10−13)HVPE on (10−13)MO-template . However, on mixed-phase MO-templates, a single-phase (11−22) GaN thick layer was found to grow even if the original templates contain both (11−22) and (10−13) plane components. Meanwhile, in contrast with the difficult growth of GaN (10−13) with a smooth surface, it is easier to acquire GaN (11−22) thick layers by a HVPE method. A wider window for the growth of the (11−22) plane could partly explain the reason why the pure GaN (11−22) plane could be grown on mixed-phase ((11−22) & (10−13)) MO-templates. In order to explain this phenomenon, both formation energy ( E f ) and migration barrier ( E m ) of these semi-polar faces wereAbstract : This work illustrates the influence of MO-templates and competition mechanism on the HVPE growth of semi-polar GaN (11−22) & (10−13) thick layers. Abstract : In this paper, the growth of semi-polar GaN thick films was investigated on an m -plane sapphire by hydride vapor phase epitaxy (HVPE). By optimizing parameters of the HVPE process, both (11−22) and (10−13) semi-polar GaN films have been successfully obtained with a mirror surface and excellent crystal quality on different GaN templates grown by metal organic chemical vapor deposition (MOCVD), respectively. The influence of MO-GaN templates on the HVPE growth was further studied. The results revealed that the same plane of a semi-polar HVPE-GaN thick layer was grown on a single-phase template, such as GaN (11−22)HVPE on (11−22)MO-template and GaN (10−13)HVPE on (10−13)MO-template . However, on mixed-phase MO-templates, a single-phase (11−22) GaN thick layer was found to grow even if the original templates contain both (11−22) and (10−13) plane components. Meanwhile, in contrast with the difficult growth of GaN (10−13) with a smooth surface, it is easier to acquire GaN (11−22) thick layers by a HVPE method. A wider window for the growth of the (11−22) plane could partly explain the reason why the pure GaN (11−22) plane could be grown on mixed-phase ((11−22) & (10−13)) MO-templates. In order to explain this phenomenon, both formation energy ( E f ) and migration barrier ( E m ) of these semi-polar faces were calculated. Our results indicated that the E f of GaN (10−13) (−0.56 eV) is higher than that of (11−22) (−10.73 eV), and the E m of (10−13) (0.30 eV) is lower than that of (11−22) (1.89 eV). So the (11−22)-plane growth was more likely to be prevalent in competition between two phases. … (more)
- Is Part Of:
- CrystEngComm. Volume 23:Issue 18(2021)
- Journal:
- CrystEngComm
- Issue:
- Volume 23:Issue 18(2021)
- Issue Display:
- Volume 23, Issue 18 (2021)
- Year:
- 2021
- Volume:
- 23
- Issue:
- 18
- Issue Sort Value:
- 2021-0023-0018-0000
- Page Start:
- 3364
- Page End:
- 3370
- Publication Date:
- 2021-04-20
- Subjects:
- Crystals -- Periodicals
Crystal growth -- Periodicals
Crystallography -- Periodicals
Cristaux -- Périodiques
Cristaux -- Croissance -- Périodiques
Cristallographie -- Périodiques
548 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/ce#!issueid=ce016040&type=current ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d1ce00040c ↗
- Languages:
- English
- ISSNs:
- 1466-8033
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 3490.168000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 16788.xml