1178 J, 527 nm near diffraction limited laser based on a complete closed-loop adaptive optics controlled off-axis multi-pass amplification laser system. (19th May 2021)

• Record Type: Journal Article
• Authors: Wang, Deen; Zhang, Xin; Dai, Wanjun; Yang, Ying; Deng, Xuewei; Chen, Lin; Xie, Xudong; Hu, Dongxia; Jing, Feng; Yang, Zeping; Yuan, Qiang; Wei, Xiaofeng; Zhu, Qihua; Zheng, Wanguo; Zhang, Xiaomin; Huang, Lei
• Is Part Of: High power laser science and engineering. Volume 9(2021)
• Publication Date: 2021-05-19
• Subjects: kilojoule, -- near diffraction limit, -- 527 nm, -- X-ray; High power lasers -- Periodicals; 621.366
• DOI: 10.1017/hpl.2021.3
• Languages: English
• ISSNs: 2095-4719

Abstract

Abstract: A 1178 J near diffraction limited 527 nm laser is realized in a complete closed-loop adaptive optics (AO) controlled off-axis multi-pass amplification laser system. Generated from a fiber laser and amplified by the pre-amplifier and the main amplifier, a 1053 nm laser beam with the energy of 1900 J is obtained and converted into a 527 nm laser beam by a KDP crystal with 62% conversion efficiency, 1178 J and beam quality of 7.93 times the diffraction limit (DL). By using a complete closed-loop AO configuration, the static and dynamic wavefront distortions of the laser system are measured and compensated. After correction, the diameter of the circle enclosing 80% energy is improved remarkably from 7.93DL to 1.29DL. The focal spot is highly concentrated and the 1178 J, 527 nm near diffraction limited laser is achieved.