Cite
HARVARD Citation
Gandla, D. et al. (2021). Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation. ChemistryOpen. 10 (4), pp. 402-407. [Online].
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Gandla, D. et al. (2021). Atomic Layer Deposition (ALD) of Alumina over Activated Carbon Electrodes Enabling a Stable 4 V Supercapacitor Operation. ChemistryOpen. 10 (4), pp. 402-407. [Online].