Effect of sputtering pressure on the structure and properties of SiO2 films prepared by magnetron sputtering. (1st October 2020)
- Record Type:
- Journal Article
- Title:
- Effect of sputtering pressure on the structure and properties of SiO2 films prepared by magnetron sputtering. (1st October 2020)
- Main Title:
- Effect of sputtering pressure on the structure and properties of SiO2 films prepared by magnetron sputtering
- Authors:
- Zhao, Leran
Zhao, Changjiang
Liu, Juncheng
Liu, Zhigang
Chen, Yan - Abstract:
- Abstract : The effects of sputtering pressure on the O/Si ratio, microstructure, surface morphology and optical properties within 300–1100 nm of SiO2 film via radio frequency magnetron sputtering were investigated. The results showed that the molar ratio of O/Si in the film increased from 1.96 to 2.03, from silicon rich to oxygen rich, with the sputtering pressure increase from 0.3 to 1.3 Pa. The SiO2 films deposited at different pressure were all amorphous. There were many ditches with a length of about 50 nm on the surface of the film deposited at lower pressure. The increase of sputtering pressure could reduce the number of ditches, and make the surface denser and more uniform. The refractive index increased first, then decreased and finally increased with the increase of sputtering pressure, and the maximum and minimum values were obtained at 0.7 and 1.1 Pa, respectively. The change of absorptivity was approximately the same as that of the refractive index, while the change of the average transmittance of coated quartz glass was exactly the opposite of refractive index. The minimum value of the average transmittance 92.6% and the maximum value 93.1% were obtained at 0.7 and 1.1 Pa, respectively.
- Is Part Of:
- Micro & nano letters. Volume 15:Number 12(2020)
- Journal:
- Micro & nano letters
- Issue:
- Volume 15:Number 12(2020)
- Issue Display:
- Volume 15, Issue 12 (2020)
- Year:
- 2020
- Volume:
- 15
- Issue:
- 12
- Issue Sort Value:
- 2020-0015-0012-0000
- Page Start:
- 872
- Page End:
- 876
- Publication Date:
- 2020-10-01
- Subjects:
- refractive index -- sputter deposition -- visible spectra -- surface morphology -- ultraviolet spectra -- silicon compounds -- thin films
film -- radio frequency magnetron sputtering -- sputtering pressure -- refractive index -- O/Si ratio -- microstructure -- surface morphology -- optical properties -- absorptivity -- average transmittance -- coated quartz glass -- size 50.0 nm -- pressure 0.3 Pa to 1.3 Pa -- wavelength 300.0 nm to 1100.0 nm -- SiO2
Nanotechnology -- Periodicals
Nanostructures -- Periodicals
Microtechnology -- Periodicals
620.5 - Journal URLs:
- http://digital-library.theiet.org/content/journals/mnl ↗
https://ietresearch.onlinelibrary.wiley.com/journal/17500443 ↗
http://www.theiet.org/ ↗ - DOI:
- 10.1049/mnl.2020.0222 ↗
- Languages:
- English
- ISSNs:
- 1750-0443
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5756.775460
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 16657.xml