Si wire array waveguide grating with parallel star coupler configuration fabricated by ArF excimer immersion lithography. Issue 6 (1st March 2013)

• Record Type: Journal Article
• Authors: Okayama, H.; Shimura, D.; Takahashi, H.; Seki, M.; Toyama, M.; Sano, T.; Koshino, K.; Yokoyama, N.; Ohtsuka, M.; Sugiyama, A.; Ishitsuka, S.; Tsuchizawa, T.; Nishi, H.; Yamada, K.; Yaegashi, H.; Horikawa, T.; Sasaki, H.
• Is Part Of: Electronics letters. Volume 49:Issue 6(2013)
• Page Start: 410
• Page End: 412
• Publication Date: 2013-03-01
• Subjects: Si -- ArF; frequency; argon compounds -- demultiplexing equipment -- diffraction gratings -- elemental semiconductors -- immersion lithography -- optical couplers -- optical waveguides -- silicon; wire array waveguide grating -- parallel star coupler -- excimer immersion lithography -- wavelength demultiplexer fabricated -- input star couplers -- output star couplers -- phase error generation -- frequency 200 GHz -- Si -- ArF; Electronics -- Periodicals; 621.381
• DOI: 10.1049/el.2013.0206
• Languages: English
• ISSNs: 0013-5194

Abstract

Abstract : An Si wire array waveguide grating wavelength demultiplexer fabricated using immersion ArF lithography is reported. The tilt directions of the input and output star couplers are aligned in the same direction to avoid phase error generated at the curved waveguides. A 16 channel device with 200 GHz wavelength spacing was fabricated.