Determining the thermal expansion coefficient of thin films for a CMOS MEMS process using test cantilevers. (22nd January 2015)
- Record Type:
- Journal Article
- Title:
- Determining the thermal expansion coefficient of thin films for a CMOS MEMS process using test cantilevers. (22nd January 2015)
- Main Title:
- Determining the thermal expansion coefficient of thin films for a CMOS MEMS process using test cantilevers
- Authors:
- Cheng, Chao-Lin
Tsai, Ming-Han
Fang, Weileun - Abstract:
- Abstract: Many standard CMOS processes, provided by existing foundries, are available. These standard CMOS processes, with stacking of various metal and dielectric layers, have been extensively applied in integrated circuits as well as micro-electromechanical systems (MEMS). It is of importance to determine the material properties of the metal and dielectric films to predict the performance and reliability of micro devices. This study employs an existing approach to determine the coefficients of thermal expansion (CTEs) of metal and dielectric films for standard CMOS processes. Test cantilevers with different stacking of metal and dielectric layers for standard CMOS processes have been designed and implemented. The CTEs of standard CMOS films can be determined from measurements of the out-of-plane thermal deformations of the test cantilevers. To demonstrate the feasibility of the present approach, thin films prepared by the Taiwan Semiconductor Manufacture Company 0.35 μ m 2P4M CMOS process are characterized. Eight test cantilevers with different stacking of CMOS layers and an auxiliary Si cantilever on a SOI wafer are fabricated. The equivalent elastic moduli and CTEs of the CMOS thin films including the metal and dielectric layers are determined, respectively, from the resonant frequency and static thermal deformation of the test cantilevers. Moreover, thermal deformations of cantilevers with stacked layers different to those of the test beams have been employed to verifyAbstract: Many standard CMOS processes, provided by existing foundries, are available. These standard CMOS processes, with stacking of various metal and dielectric layers, have been extensively applied in integrated circuits as well as micro-electromechanical systems (MEMS). It is of importance to determine the material properties of the metal and dielectric films to predict the performance and reliability of micro devices. This study employs an existing approach to determine the coefficients of thermal expansion (CTEs) of metal and dielectric films for standard CMOS processes. Test cantilevers with different stacking of metal and dielectric layers for standard CMOS processes have been designed and implemented. The CTEs of standard CMOS films can be determined from measurements of the out-of-plane thermal deformations of the test cantilevers. To demonstrate the feasibility of the present approach, thin films prepared by the Taiwan Semiconductor Manufacture Company 0.35 μ m 2P4M CMOS process are characterized. Eight test cantilevers with different stacking of CMOS layers and an auxiliary Si cantilever on a SOI wafer are fabricated. The equivalent elastic moduli and CTEs of the CMOS thin films including the metal and dielectric layers are determined, respectively, from the resonant frequency and static thermal deformation of the test cantilevers. Moreover, thermal deformations of cantilevers with stacked layers different to those of the test beams have been employed to verify the measured CTEs and elastic moduli. … (more)
- Is Part Of:
- Journal of micromechanics and microengineering. Volume 25:Number 2(2015:Feb.)
- Journal:
- Journal of micromechanics and microengineering
- Issue:
- Volume 25:Number 2(2015:Feb.)
- Issue Display:
- Volume 25, Issue 2 (2015)
- Year:
- 2015
- Volume:
- 25
- Issue:
- 2
- Issue Sort Value:
- 2015-0025-0002-0000
- Page Start:
- Page End:
- Publication Date:
- 2015-01-22
- Subjects:
- coefficient of thermal expansion -- elastic modulus -- thin films -- cantilever beam -- CMOS MEMS
Microelectromechanical systems -- Periodicals
Micromechanics -- Periodicals
621.38105 - Journal URLs:
- http://iopscience.iop.org/0960-1317 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/0960-1317/25/2/025014 ↗
- Languages:
- English
- ISSNs:
- 0960-1317
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 16401.xml