Multifunctional Films Deposited by Atomic Layer Deposition for Tailored Interfaces of Electrochemical Systems. Issue 14 (16th November 2020)

• Record Type: Journal Article
• Authors: Gutierrez, Arturo; Choudhury, Devika; Sharifi-Asl, Soroosh; Yonemoto, Bryan T.; Shahbazian-Yassar, Reza; Mane, Anil U.; Elam, Jeffrey W.; Croy, Jason
• Is Part Of: Journal of the Electrochemical Society. Volume 167:Issue 14(2020)
• Publication Date: 2020-11-16
• Subjects: Electrochemistry -- Periodicals; 541.3705
• DOI: 10.1149/1945-7111/abc768
• Languages: English
• ISSNs: 0013-4651

Abstract

Abstract : A new strategy for electrochemical interfaces that utilizes multilayer films deposited by atomic layer deposition (ALD) is introduced. Manganese-rich and nickel-rich cathode oxides were coated with a novel bilayer film of metal fluorides. Subsequent exposure to prolonged, high-voltage electrochemical cycling vs graphite electrodes revealed that the bilayer film can greatly enhance the high-voltage stability of cathode oxides. In particular, in manganese-rich cells, capacity fade due to manganese dissolution was substantially reduced and impedance rise was virtually eliminated. Furthermore, in nickel-rich NMC-811 cells, impedance rise was reduced by ∼80%, compared to the NMC-811 baseline, after ∼300 h of high-voltage exposure during cycling. The multilayer film strategy presents an exciting opportunity for tailoring designs and materials for electrochemical interfaces in advanced lithium-ion batteries and beyond.