Cite
HARVARD Citation
Numazawa, S. et al. (n.d.). Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes. Japanese journal of applied physics. p. . [Online].
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Numazawa, S. et al. (n.d.). Molecular dynamics study on fluorine radical multilayer adsorption mechanism during Si, SiO2, and Si3N4 etching processes. Japanese journal of applied physics. p. . [Online].