Atomic layer deposition of Cu2O on NH2-MIL-101(Fe) for enhanced photocatalytic performance and decreased electron/hole recombination. Issue 10 (15th May 2021)

• Record Type: Journal Article
• Authors: Geng, Jiguo; Ma, Jianling; Li, Feng; Ma, Shengqian; Zhang, Dong; Ning, Xuefeng
• Is Part Of: Ceramics international. Volume 47:Issue 10(2021)Part A
• Page Start: 13291
• Page End: 13300
• Publication Date: 2021-05-15
• Subjects: Atomic layer deposition -- Cu2O -- Metal-organic frameworks -- Photocatalytic degradation -- NH2-MIL-101(Fe) -- Electron/hole recombination; Ceramics -- Periodicals; Céramique industrielle -- Périodiques; Ceramics; Periodicals; Electronic journals; 666
• DOI: 10.1016/j.ceramint.2020.09.239
• Languages: English
• ISSNs: 0272-8842

Abstract

Abstract: Coupling appropriate semiconductor nanoparticles with massive surface-area support has become a promising but challenging strategy to photocatalyst design for enhanced photocatalytic activity in environmental cleaning applications, owing to the severe aggregation issues of nanoparticles. Herein, the atomic layer deposition (ALD) approach was applied to uniformly disperse ultrafine Cu2 O nanoparticles (5–10 nm) on metal-organic frameworks without aggregation, forming NH2 -MIL-101(Fe)/Cu2 O nanocomposite photocatalysts. The Cu2 O mass within the nanocomposites can be well controlled by merely adjusting the ALD cycles. The optimal NH2 -MIL-101(Fe)/Cu2 O displays a high photodegradation efficiency of 92% for RhB and excellent stability under visible light. The reaction kinetics and photocurrent response experimental results reveal that the optimal NH2 -MIL-101(Fe)/Cu2 O photocatalyst exhibits effective charge separation/transfer and suppressed recombination rate of charge carriers, which will significantly increase the solar light utilization efficiency and photocatalytic activity. We believe the presented photocatalyst synthesis strategy here can be generalized to construct other photocatalysts for various photocatalytic applications.