Electron Beam Lithography: CO2‐Based Dual‐Tone Resists for Electron Beam Lithography (Adv. Funct. Mater. 13/2021). (24th March 2021)

• Record Type: Journal Article
• Authors: Lu, Xin‐Yu; Luo, Hao; Wang, Kai; Zhang, Yao‐Yao; Zhu, Xiao‐Feng; Li, Dongxue; Ma, Bingze; Xiong, Shisheng; Nealey, Paul F.; Li, Qiang; Wu, Guang‐Peng
• Is Part Of: Advanced functional materials. Volume 31:Number 13(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-03-24
• Subjects: carbon dioxide capture -- electron beam lithography -- nanofabrication -- photoresist -- sustainable materials; Materials -- Periodicals; Chemical vapor deposition -- Periodicals; 620.11
• DOI: 10.1002/adfm.202170086
• Languages: English
• ISSNs: 1616-301X

Abstract

Abstract : In article number 2007417, Paul F. Nealey, Qiang Li, Guang‐Peng Wu, and co‐workers discover that CO2 ‐based polycarbonates produced by the copolymerization of CO2 and epoxides could be utilized as qualified positive and negative resists for electron beam lithography, as demonstrated by their features of full sustainability, outstanding sensitivity, high resolution, and the finely manufactured photonic crystal devices in both positive and negative tones.