Cite
HARVARD Citation
Sato, N. et al. (2021). Elementary gas‐phase reactions of radical species during chemical vapor deposition of silicon carbide using CH3SiCl3. International journal of chemical kinetics. 53 (5), pp. 638-645. [Online].
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Sato, N. et al. (2021). Elementary gas‐phase reactions of radical species during chemical vapor deposition of silicon carbide using CH3SiCl3. International journal of chemical kinetics. 53 (5), pp. 638-645. [Online].