Cite
HARVARD Citation
Hwang, J. et al. (2021). Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity. Journal of materials chemistry. 9 (11), pp. 3820-3825. [Online].
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Hwang, J. et al. (2021). Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity. Journal of materials chemistry. 9 (11), pp. 3820-3825. [Online].