Leidenfrost Motion of Water Microdroplets on Surface Substrate: Epitaxy of Gallium Oxide via Mist Chemical Vapor Deposition. Issue 6 (20th January 2021)

• Record Type: Journal Article
• Authors: Ha, Minh‐Tan; Kim, Kyoung‐Ho; Shin, Yun‐Ji; Jeong, Seong‐Min; Bae, Si‐Young
• Is Part Of: Advanced materials interfaces. Volume 8:Issue 6(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-01-20
• Subjects: Leidenfrost motion -- microdroplets -- mist chemical vapor deposition -- sedimentation -- tilted angles -- α‐Ga 2O 3; Materials science -- Periodicals; 620.11
• DOI: 10.1002/admi.202001895
• Languages: English
• ISSNs: 2196-7350

Abstract

Abstract: It is hypothesized that gravity‐driven sedimentation and gliding of water microdroplets on a substrate surface due to the Leidenfrost effect explain the deposition behaviors of epilayers via mist chemical vapor deposition (mist CVD). The deposition rate, thickness uniformity, and surface morphology are dependent on the velocity, incident angle, incident probability, gliding distance, and the lifetime of the droplets on the surface of the substrate. Practically, the deposition of corundum structured gallium oxide (α‐Ga2 O3 ) epilayers on a tilted 2‐inch c ‐plane sapphire substrate validated the hypothesis. A high substrate tilt angle and a low mist stream velocity are favorable for a high deposition rate. In contrast, a low substrate tilt angle and a high mist stream velocity are suitable for high uniformity and stable deposition of the α‐Ga2 O3 thin films via mist CVD. Abstract : The Leidenfrost motion of water micro‐droplets on hot flat substrates enables the growth of thin α‐Ga2 O3 film via mist chemical vapor deposition. The incident probability, incident angle, lifetime, and gliding distance of the microdroplets at the vicinity determine the growth behaviors of the epilayer, which could be controlled by process parameters such as mist velocity and substrate tilted angle.