Innovative front end processing for next generation CIS module production. (17th July 2015)

• Record Type: Journal Article
• Authors: Probst, Volker; Jasenek, Axel; Sandfort, Christian; Letsch, Andreas; Koetschau, Immo; Hahn, Thomas; Feichtinger, Jochen; Eschrich, Heinz
• Is Part Of: Japanese journal of applied physics. Volume 54:Number 8(2015:Aug.)Supplement 1
• Publication Date: 2015-07-17
• Subjects: Physics -- Periodicals; 621.05
• DOI: 10.7567/JJAP.54.08KC12
• Languages: English
• ISSNs: 0021-4922

Abstract

Abstract: The successful implementation of two new process steps into an existing Cu(In, Ga)(Se, S)2 (CIS) production line was achieved. One, a newly developed back contact, aims for a better process control, as far as the transition of the metallic back contact to a selenide/metal bi-layer during CIS-formation is concerned. This was done by the introduction of a corrosion resistant barrier layer, which reliably stops chalcogenide diffusion from the top. By doing so, a back contact layer is obtained, with well defined properties in which the functionalities of the back electrode now is divided between two separated layers. The other development presented in this paper, tackles the complexity of CIS-module production and the interferences between the different processes required. By shifting the P1-scribing process after i-ZnO deposition, the process sequence for CIS is simplified and it will be shown that this new P1i exhibits superior properties as far as CIS morphology and groove quality is concerned.