Cite
HARVARD Citation
Han, L. et al. (n.d.). 41.2: Invited Paper: Flexible Silicon‐oxide‐like Thin Film Encapsulation Enabled by PECVD growth at Room Temperature. Digest of technical papers. pp. 280-281. [Online].
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Han, L. et al. (n.d.). 41.2: Invited Paper: Flexible Silicon‐oxide‐like Thin Film Encapsulation Enabled by PECVD growth at Room Temperature. Digest of technical papers. pp. 280-281. [Online].