15.3: Defect Engineering in n‐Type Oxide Semiconductor TFTs. (24th February 2021)
- Record Type:
- Journal Article
- Title:
- 15.3: Defect Engineering in n‐Type Oxide Semiconductor TFTs. (24th February 2021)
- Main Title:
- 15.3: Defect Engineering in n‐Type Oxide Semiconductor TFTs
- Authors:
- Li, Guoli
He, Jiawei
Wang, Huiru
Flandre, Denis
Liao, Lei - Abstract:
- Is Part Of:
- Digest of technical papers. Volume 52(2021)Supplement 1
- Journal:
- Digest of technical papers
- Issue:
- Volume 52(2021)Supplement 1
- Issue Display:
- Volume 52, Issue 1 (2021)
- Year:
- 2021
- Volume:
- 52
- Issue:
- 1
- Issue Sort Value:
- 2021-0052-0001-0000
- Page Start:
- 101
- Page End:
- 101
- Publication Date:
- 2021-02-24
- Subjects:
- Information display systems -- Congresses
621.3815422 - Journal URLs:
- http://catalog.hathitrust.org/api/volumes/oclc/1799368.html ↗
http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2168-0159 ↗
http://ojps.aip.org/dbt/dbt.jsp?KEY=SIDSYM ↗
http://sid.aip.org/digest ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/sdtp.14391 ↗
- Languages:
- English
- ISSNs:
- 0097-966X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8271.680000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 15891.xml