34.4: Applications of Electron Beam Review System for AMOLED Patterning Process Control. (24th February 2021)

• Record Type: Journal Article
• Authors: An, Yongjun; Shao, Shiqi; Zhang, Yongzhi; Guan, Jiangbing; Wu, Nanhui; Liu, Guohua; Li, Aidan; Feng, Yinqiao; Li, Lingjia; Shen, Ricky; Virdi, Kulpreet; Muller, Bernhard; Gao, Yong
• Is Part Of: Digest of technical papers. Volume 52(2021)Supplement 1
• Page Start: 238
• Page End: 243
• Publication Date: 2021-02-24
• Subjects: OLED Display -- EBR -- optical microscope -- resolution -- critical dimension -- process control -- taper CD; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.14443
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : As the development of display technologies, much smaller critical dimension design is an inevitable trend and much tighter statistical process control is needed and necessary. Electron Beam Review System can provide much more precise critical dimension measurement without glass to be broken compared with traditional optical metrology tools. Besides, taper CD or taper angle is a critical parameter for display product quality control and Electron Beam Review System is the only tool in display Fabs that can provide such information.