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HARVARD Citation
Vashishtha, V. et al. (2020). Comparing bulk-Si FinFET and gate-all-around FETs for the 5 nm technology node. Microelectronics journal. p. . [Online].
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Vashishtha, V. et al. (2020). Comparing bulk-Si FinFET and gate-all-around FETs for the 5 nm technology node. Microelectronics journal. p. . [Online].