A theoretical investigation into the role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface: NO reduction on Cu/γ-alumina. Issue 4 (11th December 2020)
- Record Type:
- Journal Article
- Title:
- A theoretical investigation into the role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface: NO reduction on Cu/γ-alumina. Issue 4 (11th December 2020)
- Main Title:
- A theoretical investigation into the role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface: NO reduction on Cu/γ-alumina
- Authors:
- Ota, Wataru
Kojima, Yasuro
Hosokawa, Saburo
Teramura, Kentaro
Tanaka, Tsunehiro
Sato, Tohru - Abstract:
- Abstract : The role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface is investigated for NO reduction on a Cu/γ-alumina heterogeneous catalyst. Abstract : The role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface is investigated for NO reduction on a Cu/γ-alumina heterogeneous catalyst. For the solid surface, computational models of the γ-alumina surface are constructed based on the Step-by-Step Hydrogen Termination (SSHT) approach. Dangling bonds, which appear upon cutting the crystal structure of a model, are terminated stepwise with H atoms until the model has an appropriate energy gap. The obtained SSHT models reflect the realistic infrared (IR) and ultraviolet-visible (UV/Vis) spectra. Vibronic coupling density (VCD), as a reactivity index, is employed to elucidate the regioselectivity of Cu adsorption on γ-alumina and that of NO adsorption on Cu/γ-alumina in place of the frontier orbital theory that could not provide clear results. We discovered that the highly dispersed Cu atoms are loaded on Lewis-basic O atoms, which is known as the anchoring effect, located in the tetrahedral sites of the γ-alumina surface. The role of the γ-alumina support is to raise the frontier orbital of the Cu catalyst, which in turn gives rise to the electron back-donation from Cu/γ-alumina to NO. In addition, the penetration of the VCD distribution of Cu/γ-alumina into the γ-alumina support indicates that theAbstract : The role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface is investigated for NO reduction on a Cu/γ-alumina heterogeneous catalyst. Abstract : The role of catalyst support and regioselectivity of molecular adsorption on a metal oxide surface is investigated for NO reduction on a Cu/γ-alumina heterogeneous catalyst. For the solid surface, computational models of the γ-alumina surface are constructed based on the Step-by-Step Hydrogen Termination (SSHT) approach. Dangling bonds, which appear upon cutting the crystal structure of a model, are terminated stepwise with H atoms until the model has an appropriate energy gap. The obtained SSHT models reflect the realistic infrared (IR) and ultraviolet-visible (UV/Vis) spectra. Vibronic coupling density (VCD), as a reactivity index, is employed to elucidate the regioselectivity of Cu adsorption on γ-alumina and that of NO adsorption on Cu/γ-alumina in place of the frontier orbital theory that could not provide clear results. We discovered that the highly dispersed Cu atoms are loaded on Lewis-basic O atoms, which is known as the anchoring effect, located in the tetrahedral sites of the γ-alumina surface. The role of the γ-alumina support is to raise the frontier orbital of the Cu catalyst, which in turn gives rise to the electron back-donation from Cu/γ-alumina to NO. In addition, the penetration of the VCD distribution of Cu/γ-alumina into the γ-alumina support indicates that the excessive reaction energy dissipates into the support after NO adsorption and reduction. In other words, the support plays the role of a heat bath. The NO reduction on Cu/γ-alumina proceeds even in an oxidative atmosphere because the Cu–NO bond is strong compared to the Cu–O2 bond. … (more)
- Is Part Of:
- Physical chemistry chemical physics. Volume 23:Issue 4(2020)
- Journal:
- Physical chemistry chemical physics
- Issue:
- Volume 23:Issue 4(2020)
- Issue Display:
- Volume 23, Issue 4 (2020)
- Year:
- 2020
- Volume:
- 23
- Issue:
- 4
- Issue Sort Value:
- 2020-0023-0004-0000
- Page Start:
- 2575
- Page End:
- 2585
- Publication Date:
- 2020-12-11
- Subjects:
- Chemistry, Physical and theoretical -- Periodicals
541.3 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/cp#!issueid=cp016040&type=current&issnprint=1463-9076 ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d0cp04895j ↗
- Languages:
- English
- ISSNs:
- 1463-9076
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 6475.306000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 15814.xml