Cite
HARVARD Citation
Rozé, F. et al. (2016). Comparative Analysis of Growth Rate Enhancement and Ge Redistribution during Silicon-Germanium Oxidation by Rapid Thermal Oxidation. ECS transactions. pp. 67-78. [Online].
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Rozé, F. et al. (2016). Comparative Analysis of Growth Rate Enhancement and Ge Redistribution during Silicon-Germanium Oxidation by Rapid Thermal Oxidation. ECS transactions. pp. 67-78. [Online].