Fluorescence Microscopy Characterization of Patterned Nano-Crystalline Quantum Dot Films. (23rd August 2016)

• Record Type: Journal Article
• Authors: Sabeeh, Ala; Price, Jared; Ruzyllo, Jerzy
• Is Part Of: ECS transactions. Volume 75:Number 11(2016)
• Page Start: 45
• Page End: 50
• Publication Date: 2016-08-23
• Subjects: Electrochemistry -- Periodicals; Electrochemistry; Periodicals; Electronic journals; Electronic journal; 541.37
• DOI: 10.1149/07511.0045ecst
• Languages: English
• ISSNs: 1938-5862

Abstract

Abstract : This experiment is a continuation of the study concerned with the lift-off based patterning of nanocrystaline quantum dot (NQD) films. The NQD films patterned by lift-off process are analyzed by means of fluorescence microscopy to obtain information about film uniformity, pattern definition accuracy, and average fluorescence intensity. The lift-off process is implemented using wet (acetone immersion) and dry (oxygen plasma) photoresist removing ambient. Methods under investigation were found to perform similarly in terms of pattern resolution accuracy. However, in terms of the uniformity of fluorescence intensity distribution, acetone dissolution of photoresist was found to produce better results.