(Invited) Atomic Layer Deposition of Nanoalloys of Noble and Non-Noble Metals. (14th August 2017)

• Record Type: Journal Article
• Authors: Ramachandran, Ranjith K.; Dendooven, Jolien; Filez, Matthias; Galvita, Vladimir V.; Poelman, Hilde; Solano, Eduardo; Minjauw, Matthias M.; Marin, Guy B.; Detavernier, Christophe
• Is Part Of: ECS transactions. Volume 80:Number 3(2017)
• Page Start: 97
• Page End: 106
• Publication Date: 2017-08-14
• Subjects: Electrochemistry -- Periodicals; Electrochemistry; Periodicals; Electronic journals; Electronic journal; 541.37
• DOI: 10.1149/08003.0097ecst
• Languages: English
• ISSNs: 1938-5862

Abstract

Abstract : We present a novel ALD-based approach for the synthesis of bimetallic materials consisting of a noble metal along with a non-noble metal such as Pt-M (M = In, Ga, Sn, etc.), with a precise control on the composition and size. First, a bilayer consisting of a metal oxide and a Pt film of the desired thickness is deposited on to the substrate. The film is then subjected to a temperature programmed reduction (TPR) under H2 atmosphere. In situ X-ray diffraction (XRD) measurements during TPR revealed the formation of Pt–M bimetallic alloys with a phase determined by the Pt/(Pt + M) atomic ratio of the as-deposited bilayer. Scanning electron microscopic (SEM) analysis revealed the formation nanoparticles after annealing, with the particle size controlled by the initial total thickness of the bilayer.