Methods of Patterned Mist Deposition of Nano-Crystalline Quantum Dot Films. (11th March 2015)

• Record Type: Journal Article
• Authors: Sabeeh, Ala; Thakur, Yash; Chao, Ju-Hung; Kshirsagar, Aditya; Ruzyllo, Jerzy
• Is Part Of: ECS transactions. Volume 64:Number 43(2014)
• Page Start: 1
• Page End: 5
• Publication Date: 2015-03-11
• Subjects: Electrochemistry -- Periodicals; Electrochemistry; Periodicals; Electronic journals; Electronic journal; 541.37
• DOI: 10.1149/06443.0001ecst
• Languages: English
• ISSNs: 1938-5862

Abstract

Abstract : This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.