Communication—Dissolution Measurement of Ni (111) in an Acidic Solution Using X-ray Reflectometry. Issue 6 (29th March 2017)

• Record Type: Journal Article
• Authors: Ha, Hung; Fritzsche, Helmut; Burton, Gordon; Ulaganathan, Jaganathan
• Is Part Of: Journal of the Electrochemical Society. Volume 164:Issue 6(2017)
• Page Start: C258
• Page End: C260
• Publication Date: 2017-03-29
• Subjects: dissolution -- Nickel -- passive film -- thin film -- X-ray reflectometry; Electrochemistry -- Periodicals; 541.3705
• DOI: 10.1149/2.0771706jes
• Languages: English
• ISSNs: 0013-4651

Abstract

Abstract : The dissolution of a Ni (111) thin film exposed to a 0.1 M NaCl (pH4) solution was monitored for a period of 816 hours using X-ray reflectometry. The dissolution rate of the Ni (111) film decreased from approximately 9 Å/h at the beginning of the immersion experiment to 0.05 Å/h after 816-hour exposure. After reaching a steady state between formation and dissolution, the thickness of the NiO passive film remained constant at approximately 18 Å during the immersion experiment.