Cite
HARVARD Citation
Chien, Y. et al. (2018). A Design for Selective Wet Etching of Si3N4/SiO2 in Phosphoric Acid Using a Single Wafer Processor. Journal of the Electrochemical Society. 165 (4), pp. H3187-H3191. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Chien, Y. et al. (2018). A Design for Selective Wet Etching of Si3N4/SiO2 in Phosphoric Acid Using a Single Wafer Processor. Journal of the Electrochemical Society. 165 (4), pp. H3187-H3191. [Online].