Cite
HARVARD Citation
Kurashima, K. et al. (2019). High-Temperature Reactor Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Chemical Vapor Deposition. ECS journal of solid state science and technology. pp. P400-P406. [Online].
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Kurashima, K. et al. (2019). High-Temperature Reactor Cleaning Using Chlorine Trifluoride Gas for Silicon Carbide Chemical Vapor Deposition. ECS journal of solid state science and technology. pp. P400-P406. [Online].