Cite
HARVARD Citation
Kim, J. et al. (2018). Plasma Etching of SiO2 Using Heptafluoropropyl Methyl Ether and Perfluoropropyl Vinyl Ether. ECS journal of solid state science and technology. pp. Q218-Q221. [Online].
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Kim, J. et al. (2018). Plasma Etching of SiO2 Using Heptafluoropropyl Methyl Ether and Perfluoropropyl Vinyl Ether. ECS journal of solid state science and technology. pp. Q218-Q221. [Online].