Graphene Synthesis and Processing on Ge Substrates. (29th March 2017)

• Record Type: Journal Article
• Authors: Lupina, G.; Lukosius, M.; Lippert, G.; Dabrowski, J.; Kitzmann, J.; Lisker, M.; Kulse, P.; Krüger, A.; Fursenko, O.; Costina, I.; Trusch, A.; Yamamoto, Y.; Wolff, A.; Schroeder, T.; Mai, A.
• Is Part Of: ECS journal of solid state science and technology. Volume 6:Number 5(2017)
• Page Start: M55
• Page End: M59
• Publication Date: 2017-03-29
• Subjects: CVD -- Graphene -- Integration -- metrology -- wafer-scale; Solid state chemistry -- Periodicals; Electronics -- Materials -- Periodicals; Electrochemistry -- Periodicals; 541.0421
• DOI: 10.1149/2.0141705jss
• Languages: English
• ISSNs: 2162-8777

Abstract

Abstract : We review some of the recent results obtained on the graphene synthesis on Ge(100)/Si(100) substrates by molecular beam epitaxy and wafer scale chemical vapor deposition. We outline some of the identified challenges in synthesis and present first experimental results on patterning and in-line metrology of graphene in a 200 mm wafer pilot line.