Development of an Intermediate Layer for Highly Reliable Encapsulation Structures for OLED Displays. (31st December 2015)

• Record Type: Journal Article
• Authors: Ueno, Satoko; Konishi, Yoshiyuki; Azuma, Kazufumi
• Is Part Of: ECS journal of solid state science and technology. Volume 5:Number 3(2016)
• Page Start: R21
• Page End: R25
• Publication Date: 2015-12-31
• Subjects: Chemical vapor deposition -- High barrier -- Low temperature -- Multilayer structure -- OLED display -- Surface wave plasma -- Water-impermeable; Solid state chemistry -- Periodicals; Electronics -- Materials -- Periodicals; Electrochemistry -- Periodicals; 541.0421
• DOI: 10.1149/2.0041603jss
• Languages: English
• ISSNs: 2162-8777

Abstract

Abstract : We have developed multilayer structures for organic light-emitting displays to obtain highly reliable encapsulation performance using SiNx and SiOx Cy films prepared by surface-wave-plasma enhanced chemical vapor deposition (SWP-CVD). In this study, we examine three types of intermediate layers prepared by different deposition methods with different ingredients. As a result, a 3-μm-thick SiOx Cy film fabricated with hexamethyldisiloxane prepared by SWP-CVD acted as an intermediate layer, delaying the infiltration of moisture and oxygen through defects in the SiNx barrier film.