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HARVARD Citation
Krahl, F. et al. (2021). Characterization of ZnO/AlOx/benzene thin-film heterostructures grown through atomic layer deposition/molecular layer deposition. Semiconductor science and technology. p. . [Online].
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Krahl, F. et al. (2021). Characterization of ZnO/AlOx/benzene thin-film heterostructures grown through atomic layer deposition/molecular layer deposition. Semiconductor science and technology. p. . [Online].