Features of AlN film grown by ion-plasma sputtering. (August 2016)

• Record Type: Journal Article
• Authors: Lubyanskiy, Ya V; Bondarev, A D; Soshnikov, I P; Kotlyar, K P; Kirilenko, D A; Bert, N A; Ayusheva, K R; Tarasov, I S
• Is Part Of: Journal of physics. Volume 741(2016)
• Publication Date: 2016-08
• Subjects: Physics -- Congresses; 530.5
• DOI: 10.1088/1742-6596/741/1/012041
• Languages: English
• ISSNs: 1742-6588

Abstract

Abstract: The work under consideration presents research of structure, composition and optical properties of aluminium nitride thin films grown by reactive ion plasma sputtering. Aluminium nitride films are shown to contain amorphous and polycrystalline phases. Amorphous phase presence influences on refraction and absorption indexes. Conditions of polycrystalline films with primary (dedicated) orientation synthesis are revealed.