Low-temperature deposition and hardness enhancement of α-(Al, Cr)2O3 films by reactive high power pulsed magnetron sputtering. (18th November 2020)

• Record Type: Journal Article
• Authors: Cheng, Yitian; Chu, Chenglin; Zhou, Peng
• Is Part Of: Materials research express. Volume 7:Number 11(2020)
• Publication Date: 2020-11-18
• Subjects: magnetron sputtering -- thin films -- alloy target -- hardness; Materials science -- Research -- Periodicals; Materials science -- Periodicals; 620.11
• DOI: 10.1088/2053-1591/abc7e1
• Languages: English
• ISSNs: 2053-1591

Abstract

Abstract: This paper offers a method to grow corundum structure thin films of α -(Al, Cr)2 O3 in a High Power Pulsed Magnetron Sputtering (HPPMS) system. The films were characterized by grazing incidence x-ray diffraction (GIXRD), scanning electron microscope (SEM), transmission electron microscope (TEM) and nanoindentation. The results indicate that stoichiometric α -(Al, Cr)2 O3 film could be deposited at 540 °C without the formation of other metastable phases. The stable process of the magnetron sputtering ensures the smooth and compact surface of the film composed of nano-scale particles. The Cr in films can induce the formation of solid solution and enhance the mechanical property of the films. The hardness of the α -(Al, Cr)2 O3 was calculated as ∼25.6 GPa, which is much higher than that of the film deposited using the Al target. These results are considered have positive effect on the low-cost depositing α -phase alumina films on high speed steel substrates as cutting tools.