Cite
HARVARD Citation
Wehring, B. et al. (2020). Analysis of the composition of tantalum nitride in CMOS metallization trenches using parallel angle‐resolved XPS. Surface and interface analysis. pp. 962-967. [Online].
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Wehring, B. et al. (2020). Analysis of the composition of tantalum nitride in CMOS metallization trenches using parallel angle‐resolved XPS. Surface and interface analysis. pp. 962-967. [Online].