An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Device in Wafer-foundries. (August 2020)

Record Type:
Journal Article
Title:
An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Device in Wafer-foundries. (August 2020)
Main Title:
An Approach to Extend Electron Holography into Characterization on Dopant Profiles for FinFET of Nanometer Semiconductor Device in Wafer-foundries
Authors:
Zhao, Wayne
Mitchell, Travis
Abstract:
Is Part Of:
Microscopy and microanalysis. Volume 26:(2020)Supplement 2
Journal:
Microscopy and microanalysis
Issue:
Volume 26:(2020)Supplement 2
Issue Display:
Volume 26, Issue 2 (2020)
Year:
2020
Volume:
26
Issue:
2
Issue Sort Value:
2020-0026-0002-0000
Page Start:
1412
Page End:
1413
Publication Date:
2020-08
Subjects:
Microscopy -- Periodicals
Microchemistry -- Periodicals
502.82
Journal URLs:
https://academic.oup.com/mam ↗
http://journals.cambridge.org/action/displayJournal?jid=MAM ↗
http://link.springer.de/link/service/journals/10005/index.htm ↗
http://firstsearch.oclc.org ↗
DOI:
10.1017/S1431927620018012 ↗
Languages:
English
ISSNs:
1431-9276
Deposit Type:
Legaldeposit
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:
British Library HMNTS - ELD Digital store
Ingest File:
14979.xml