In situ optical characterizations of the annealing effects upon SnO2:F films by spectroscopic ellipsometry. (28th October 2016)

• Record Type: Journal Article
• Authors: Yuan, Guangzhong; Wang, Kangkai; Li, Ming; Gao, Qian; Liu, Yong; Jia, Shaohui; Song, Chenlu; Han, Gaorong
• Is Part Of: Materials research express. Volume 3:Number 10(2016)
• Publication Date: 2016-10-28
• Subjects: FTO film -- post annealing -- spectroscopic ellipsometry; Materials science -- Research -- Periodicals; Materials science -- Periodicals; 620.11
• DOI: 10.1088/2053-1591/3/10/105048
• Languages: English
• ISSNs: 2053-1591

Abstract

Abstract: In situ study of the annealing effects, up to 600 °C, upon the optical performance of SnO2 :F films have been successfully conducted with spectroscopic ellipsometry. The thickness and optical parameters were obtained by the regression of the measured ellipsometry parameters using a five-layer model. The results show that the re-densification of the SnO2 :F layers occurs at above 200 °C, resulting in an irreversible thickness reducing from about 326 nm to about 321 nm. The refractive index of the SnO2 :F layer increases with temperature and decreases in the cooling period. The in situ temperature dependence of the average refractive index has a good agreement with the sheet resistance measurement results, not only verifying the annealing process deteriorates the low-emissivity performance, but also demonstrates that spectroscopic ellipsometry method is a suitable optical characterization technique to adjust the on-line coating process of float glass.