Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus. (27th September 2019)
- Record Type:
- Journal Article
- Title:
- Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus. (27th September 2019)
- Main Title:
- Diameter modulation of 3D nanostructures in focused electron beam induced deposition using local electric fields and beam defocus
- Authors:
- Pablo-Navarro, Javier
Sangiao, Soraya
Magén, César
de Teresa, José María - Abstract:
- Abstract: Focused electron beam induced deposition (FEBID) is a leading nanolithography technique in terms of resolution and the capability for three-dimensional (3D) growth of functional nanostructures. However, FEBID still presents some limitations with respect to the precise control of the dimensions of the grown nano-objects as well as its use on insulating substrates. In the present work, we overcome both limitations by employing electrically-biased metal structures patterned on the surface of insulating substrates. Such patterned metal structures serve for charge dissipation and also allow the application of spatially-dependent electric fields. We demonstrate that such electric fields can dramatically change the dimensions of the growing 3D nanostructures by acting on the primary electron beam and the generated secondary electrons. In the performed experiments, the diameter of Pt-C and W-C vertical nanowires grown on quartz, MgO and amorphous SiO2 is tuned by application of moderate voltages (up to 200 V) on the patterned metal microstructures during growth, achieving diameters as small as 50 nm. We identify two competing effects arising from the generated electric fields: a slight change in the primary beam focus point and a strong action on the secondary electrons. Beam defocus is exploited to achieve the in situ modulation of the diameter of 3D FEBID structures during growth.
- Is Part Of:
- Nanotechnology. Volume 30:Number 50(2019)
- Journal:
- Nanotechnology
- Issue:
- Volume 30:Number 50(2019)
- Issue Display:
- Volume 30, Issue 50 (2019)
- Year:
- 2019
- Volume:
- 30
- Issue:
- 50
- Issue Sort Value:
- 2019-0030-0050-0000
- Page Start:
- Page End:
- Publication Date:
- 2019-09-27
- Subjects:
- focused electron beam induced deposition -- three-dimensional nanostructures -- nanowires -- nanolithography -- electrically-biased growth
Nanotechnology -- Periodicals
Nanotechnology -- Periodicals
Nanotechnology
Publications périodiques
Nanotechnologies
Periodicals
620.5 - Journal URLs:
- http://www.iop.org/Journals/na ↗
http://iopscience.iop.org/0957-4484/ ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6528/ab423c ↗
- Languages:
- English
- ISSNs:
- 0957-4484
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 14791.xml