Deep Neural Network Enabled Space Group Identification in EBSD. (June 2020)

• Record Type: Journal Article
• Authors: Kaufmann, Kevin; Zhu, Chaoyi; Rosengarten, Alexander S.; Vecchio, Kenneth S.
• Is Part Of: Microscopy and microanalysis. Volume 26:Number 3(2020)
• Page Start: 447
• Page End: 457
• Publication Date: 2020-06
• Subjects: convolutional neural network, -- crystal structure, -- EBSD, -- machine learning, -- space groups; Microscopy -- Periodicals; Microchemistry -- Periodicals; 502.82
• DOI: 10.1017/S1431927620001506
• Languages: English
• ISSNs: 1431-9276

Abstract

Abstract: Electron backscatter diffraction (EBSD) is one of the primary tools in materials development and analysis. The technique can perform simultaneous analyses at multiple length scales, providing local sub-micron information mapped globally to centimeter scale. Recently, a series of technological revolutions simultaneously increased diffraction pattern quality and collection rate. After collection, current EBSD pattern indexing techniques (whether Hough-based or dictionary pattern matching based) are capable of reliably differentiating between a "user selected" set of phases, if those phases contain sufficiently different crystal structures. EBSD is currently less well suited for the problem of phase identification where the phases in the sample are unknown. A pattern analysis technique capable of phase identification, utilizing the information-rich diffraction patterns potentially coupled with other data, such as EDS-derived chemistry, would enable EBSD to become a high-throughput technique replacing many slower (X-ray diffraction) or more expensive (neutron diffraction) methods. We utilize a machine learning technique to develop a general methodology for the space group classification of diffraction patterns; this is demonstrated within the $\lpar 4/m\comma \;\bar{3}\comma \;\;2/m\rpar$ point group. We evaluate the machine learning algorithm's performance in real-world situations using materials outside the training set, simultaneously elucidating the role of atomic scattering factors, orientation, and pattern quality on classification accuracy.