Graphene based Van der Waals contacts on MoS2 field effect transistors. (9th October 2020)
- Record Type:
- Journal Article
- Title:
- Graphene based Van der Waals contacts on MoS2 field effect transistors. (9th October 2020)
- Main Title:
- Graphene based Van der Waals contacts on MoS2 field effect transistors
- Authors:
- Mootheri, Vivek
Arutchelvan, Goutham
Banerjee, Sreetama
Sutar, Surajit
Leonhardt, Alessandra
Boulon, Marie-Emmanuelle
Huyghebaert, Cedric
Houssa, Michel
Asselberghs, Inge
Radu, Iuliana
Heyns, Marc
Lin, Dennis - Abstract:
- Abstract: Device performance of two dimensional (2D) material based field effect transistors is severely limited by the relatively high contact resistance encountered at the contact-channel interface. Metal-graphene hybrid contacts have been previously used to improve the contact resistance of devices based on thick exfoliated materials. Here we report a novel 2D FET fabrication process entailing the transfer of metal-graphene hybrid contacts on top of 3 monolayer-thick chemical vapor deposition (CVD) MoS2, enabling a lithography free contacting strategy, with respect to MoS2 . Three different metal-graphene stacks consisting of Ni, Pd and Ru, have been fabricated, transferred onto MoS2 and characterized extensively using electrical and physical characterization techniques. We find strong correlation between the measured electrical characteristics and physical characterization of the contact interface. From Raman spectra measurement, maximum charge transfer of 1.7 × 10 13 cm −2 is observed between graphene and Ru, leading to an improved contact resistance for MoS2 devices with Ru-Gr contacts. Ru-Gr contact shows the lowest contact resistance of 9.34 kΩ · µ m among the three metal-graphene contact stacks reported in this article. This contact resistance is also the best among reported CVD grown graphene contacted MoS2 devices. Using more than 400 devices, we study the impact of the different metal-graphene contacts on other electrical parameters such as hysteresis,Abstract: Device performance of two dimensional (2D) material based field effect transistors is severely limited by the relatively high contact resistance encountered at the contact-channel interface. Metal-graphene hybrid contacts have been previously used to improve the contact resistance of devices based on thick exfoliated materials. Here we report a novel 2D FET fabrication process entailing the transfer of metal-graphene hybrid contacts on top of 3 monolayer-thick chemical vapor deposition (CVD) MoS2, enabling a lithography free contacting strategy, with respect to MoS2 . Three different metal-graphene stacks consisting of Ni, Pd and Ru, have been fabricated, transferred onto MoS2 and characterized extensively using electrical and physical characterization techniques. We find strong correlation between the measured electrical characteristics and physical characterization of the contact interface. From Raman spectra measurement, maximum charge transfer of 1.7 × 10 13 cm −2 is observed between graphene and Ru, leading to an improved contact resistance for MoS2 devices with Ru-Gr contacts. Ru-Gr contact shows the lowest contact resistance of 9.34 kΩ · µ m among the three metal-graphene contact stacks reported in this article. This contact resistance is also the best among reported CVD grown graphene contacted MoS2 devices. Using more than 400 devices, we study the impact of the different metal-graphene contacts on other electrical parameters such as hysteresis, sub-threshold swing and threshold voltage. The metal-graphene contact stack transfer technique represents a technologically relevant contacting approach which can be further up-scaled to larger wafer areas. … (more)
- Is Part Of:
- 2D materials. Volume 8:Number 1(2021)
- Journal:
- 2D materials
- Issue:
- Volume 8:Number 1(2021)
- Issue Display:
- Volume 8, Issue 1 (2021)
- Year:
- 2021
- Volume:
- 8
- Issue:
- 1
- Issue Sort Value:
- 2021-0008-0001-0000
- Page Start:
- Page End:
- Publication Date:
- 2020-10-09
- Subjects:
- 2D materials -- MoS2 -- graphene -- contact resistance -- field effect transistor -- transferred contacts -- Ruthenium-graphene hybrid contacts
Graphene -- Periodicals
Materials science -- Periodicals
Nanostructured materials -- Periodicals
620.115 - Journal URLs:
- http://iopscience.iop.org/2053-1583 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/2053-1583/abb959 ↗
- Languages:
- English
- ISSNs:
- 2053-1583
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 14643.xml