Leading nano-Ag particles on the textured seed layer to enhance the optoelectronic properties of Al–doped ZnO layers. (June 2015)

• Record Type: Journal Article
• Authors: Lin, Yen-Sheng; Wu, Ze-Syue
• Is Part Of: Vacuum. Volume 116(2015)
• Page Start: 139
• Page End: 143
• Publication Date: 2015-06
• Subjects: RF magnetron sputtering -- AZO ultra-thin film -- Figure of merit -- Tapered structures -- Nano-Ag particles; Vacuum -- Periodicals; 621.55
• DOI: 10.1016/j.vacuum.2015.03.007
• Languages: English
• ISSNs: 0042-207X

Abstract

Abstract: In this study, the textured surface of the AZO is treated as a seed layer, which leads to the uniform deposition of nano-Ag particles on the surface. Finally, the AZO(20 nm)/nano-Ag/AZO(20 nm) ultra-thin film is grown as a transparent conductive thin film. The results show that the AZO seed layer is annealed after 500 °C and then the surface is etched using 0.1% Nitric Acid (HNO3) for 150 s, which produces a more uniform distribution of pure Ag nano particles on the textured surface of the AZO seed layer. The resistance of the thin film has a low as 4.21 × 10 −5 Ω-cm and the average transmittance in the visible range is increased to 88.7%. The best figure of merit for the thin film is 2.84 × 10 −2 Ω −1, which means that AZO is suitable for use in a transparent conductive thin film. Highlights: The textured surface of the AZO is treated as a seed layer. Improvement of the transmittance on the AZO thin film. The electrostatic interactions on the tapered structures. Promoting the application of AZO thin film on transparent conductive oxide.